Citation: | JIA Jing, ZHANG Ying-xin, TONG Jian, LI Wen-jun. Determination of Impurity Elements in High Purity Graphite by ICP-MS after Mixture Acid Digestion in Reflux Condenser System[J]. Journal of Chinese Mass Spectrometry Society, 2009, 30(4): 229-233. |
[1] |
蔡绍勤,李昌世.高纯金属和半导体材料分析[M].北京:冶金工业出版社,1995:328-329.
|
[2] |
YUKIHIRO K, AKIRA N. Determination of trace metal impurities in graphite powders by acid pressure decomposition and inductively coupled plasma atomic emission spectrometry[J]. Analyst, 1993, 118: 827-830.
|
[3] |
WATANABE K, INAGAWA J. Determination of impurity elements in graphite by acid decomposition-inductively coupled plasma atomic emission spectrometry[J]. Analyst, 1996, 121(5): 623-625.
|
[4] |
张爱滨,魏进武,王〓燕,等.顺序扫描ICP-AES法测定高纯石墨灰分中14 种杂质金属元素的方法研究[J].青岛海洋大学学报,2003,33(4):609-614.
|
[5] |
WATANABE M, NARUKAWA A. Determination of impurity elements in high purity graphite by inductively coupled plasma atomic emission spectrometry after microwave decomposition[J]. Analyst, 2000, 125: 1 189-1 191.
|
[6] |
SCHFFER U, KRIVAN V. Analysis of high purity graphite and silicon carbide by direct solid sampling electrothermal atomic absorption spectrometry[J]. Fresenius J Anal Chem, 2001, 371(6): 859-866.
|
[7] |
YAMAGUCHI H, ITOH S, IGARASHI S, et al. Determination of trace impurities in graphite and silicon carbide by total reflection X-ray fluorescence spectrometry after homogeneous liquidliquid extraction[J]. ISIJ International, 2000, 40(8): 779-782.
|
[8] |
国家技术监督局. GB/T 3521-95 石墨化学分析方法[S].北京:中国标准出版社,1995.
|
[9] |
ROBERT THOMAS. ICP-MS实践指南[M]. 李金英, 译. 北京:原子能出版社,2007:85.
|
[10] |
谢华林,聂西度,唐有根.高分辨等离子体质谱法直接测定高纯镓中的痕量元素[J].分析化学,2006,34(11):1 570-1 574.
|