口罩污染物苯甲醛的光化学氧化反应的直接质谱监测

Direct Electrospray Ionization Mass Spectrometry for Monitoring of Photochemical Oxidation Reaction of Benzaldehyde in Face Mask

  • 摘要: 苯甲醛化学性质活泼,是口罩原料及制造过程中容易产生的有机污染物。本文采用直接质谱技术监测口罩中苯甲醛在光照与臭氧条件下发生的光化学氧化反应中间体及产物,并用全二维气相色谱-质谱进行验证,探究苯甲醛的光化学反应和氧化反应机制。结果表明,经日光照射、紫外光照射或臭氧处理之后,口罩污染物苯甲醛可以生成二苯甲酮、4-戊烯酸、苯甲酸甲酯和苯甲酸等产物和中间体。口罩中苯甲醛的光化学氧化过程的质谱监测,有望为不同环境条件下口罩污染物的研究与控制提供新途径。

     

    Abstract: Face masks are usually used to prevent inhalable particles and microdroplets that may enter the nose and mouth. However, a lot of organic contaminants can be found in materials, manufacturing processes, or packaging of face mask, so there is a potential health risk during mask-wearing for a long time. Benzaldehyde is one of the simple and common aromatic aldehydes with highly active chemical properties, which is one of the typical contaminants in face mask and is a high-risk volatile organic compound for human health. To understand the potential health risk of benzaldehyde during wearing a mask, it is of great significance to monitor the possible photochemical reaction of benzaldehyde during mask-wearing under the conditions of sunshine and ozone. Mass spectrometry has attracted extensive attention in monitoring chemical reactions under complex environmental conditions, because of its high sensitivity, excellent accuracy and fast signal response. Direct mass spectrometry can provide a powerful tool for sample analysis, which requires no or little sample pretreatment. In this study, the products of benzaldehyde under different treatment conditions were investigated by direct mass spectrometry with direct electrospray ionization on mask material, and were further verified by comprehensive two-dimensional gas chromatography-mass spectrometry (GC×GC-MS) that can provide a high-resolution separation and highly sensitive detection for complex volatile samples. Photochemical reaction and oxidation reaction mechanisms of benzaldehyde were also proposed. The results showed that many organic compounds such as benzophenone, 4-pentenoic acid, methyl benzoate, benzoic acid can be formed by benzaldehyde under exposure to ultraviolet (UV) light and ozone. This method can provide a new way to gain insight into contaminants of mask devices under different environmental conditions.

     

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