二-(4-羟基丁基)四甲基二硅氧烷的质谱分析

Analysis of Bis-(4-hydroxybutyl)tetramethyldisiloxane by Mass Spectrometry

  • 摘要: 以二甲基二氯硅烷、四氢呋喃和金属镁粉为原料 ,合成二 -(4-羟基丁基 )四甲基二硅氧烷。在轰击电子能量分别为 70、3 0和 1 0 e V的情况下 ,用色谱 /质谱联用仪对其结构进行了质谱测试分析。结果表明 :没有检出该化合物的分子离子峰 ,但多次检测均发现有 (M+3 )峰存在 ,且 (M+3 )峰绝对强度随电子能量的下降而减小 ,甚至消失

     

    Abstract: Starting from dimethyldichlorosilane, tetrahydrofuran and magnesium powder as materials, bis-(4-hydroxybutyl)tetramethyldisiloxane was synthesized. Under different bombardment electron eneries, such as 70 eV, 30 eV and 10 eV, the mass spectra of the title compound is determined with GC/MS. The mass spectrometric analyses indicates that, though molecular ion peak (M +) was not found, but the existence of (M+3) is found. When the bombardment voltage was reduced, the absolute strength of the (M+3) peak declines, and even disappeares.

     

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