磺隆类除草剂的飞行时间二次离子质谱研究

TOF-SIMS Analysis of Sulfonylurea Herbicide

  • 摘要: 采用飞行时间二次离子质谱(TOF-SIMS)分析6种磺隆类除草剂,获得了它们的正离子和负离子谱图。数据显示,这类除草剂在TOF-SIMS谱图中均出现准分子离子峰和特征碎片离子峰。裂分机理讨论进一步表明,这类除草剂的典型碎片化发生在化合物结构中酰胺基团的C-N键之间,可获得较大质量片段的碎片化离子以及准分子离子的主要原因是其芳香结构的稳定化作用。结果表明,尽管TOF-SIMS由于其特殊电离方式通常容易导致一般有机分子的高度碎片化,但还是有望用于磺隆类除草剂及其衍生物或降解物的定性检测。

     

    Abstract: In order to learn more about the ethyl herbicide residues, we selected six commonly used herbicides as study. These six sulfonylurea herbicides, including bensulfuron-methyl, chlorsulfuron-methyl,pyrazosulfuron-methyl, metsulfuron-methyl, tribenuron-methyl and thifensulfuronmethyl were analyzed by time-of-flight secondary ion mass spectrometry (TOF-SIMS), equipped with gallium gun (69Ga), both their positive and negative ion spectra were obtained clearly. The data show that quasi-molecular ions and recognizable fragment ions are present in the spectra. The main large fragment ions come from cleavage of C—N bond of the group of acid amide in their structure, according to their fragmentation pathways we discussed. The summing-up we discussed mostly based on the stability of chemical bonds and molecular weight of combined fracture fragments. In conclusion, TOF-SIMS is expected to qualitatively determine sulfonylurea herbicides as well as their derivatives with high sensitivity and high speed. It can provide a theoretical basis for the analysis of sulfonylurea herbicide and their residues.

     

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